Nanolayered coated cutting tool and method for making the same

ABSTRACT

A nanolayered coated cutting tool that includes a substrate that has a surface with a coating on the surface thereof. The coating comprises a plurality of coating sets of alternating nanolayers of titanium nitride and titanium aluminum nitride wherein each coating set has a thickness up to about 100 nanometers. The coating includes a bonding region and an outer region. The bonding region comprises a plurality of the coating sets wherein the thickness of each coating set increases as the set moves away from the surface of the substrate. The outer region comprises a plurality of the coating sets wherein the thickness of each coating set is about equal.

FIELD OF THE INVENTION

[0001] The invention pertains to a multi-layered coated cutting tool anda method for making the same. More particularly, the invention pertainsto a nanolayered coated cutting tool and a method for making the same.In this regard, a nanolayered coated cutting tool has a coating schemethat comprises adjacent coating nanolayers having thicknesses of about100 nanometers or less.

BACKGROUND OF THE INVENTION

[0002] Multi-layered coated cutting tools demonstrate excellentmetalcutting properties in certain circumstances. Typically, amulti-layered coated cutting tool comprises a substrate with a pluralityof coating layers deposited thereon. In some cases the coating layerscomprise a plurality of sets of alternating coating layers. In thisregard, U.S. Pat. No. 6,103,357 to Selinder et al. for a MULTILAYEREDCOATED CUTTING TOOL shows a multi-layered non-repetitive coating schemein which the layers have a thickness that ranges between 0.1 to 30nanometers. PCT Patent Application WO98/44163 to Sjöstrand et al. for aMULTILAYERED COATED CUTTING TOOL shows a multi-layered repetitivecoating scheme in which each repeat period has a thickness that rangesbetween 3 and 100 nanometers.

[0003] Other exemplary coating schemes comprise multi-layered titaniumnitride/titanium aluminum nitride coatings deposited by physical vapordeposition (PVD) techniques. Such coating schemes are described in Hsiehet al., “Deposition and Characterization of TiAlN and multi-layeredTiN/TiAlN coatings using unbalanced magnetron sputtering”, Surface andCoatings Technology 108-109 (1998) pages 132-137 and Andersen et al.,“Deposition, microstructure and mechanical and tribological propertiesof magnetron sputtered TiN/TiAlN multilayers”, Surface and CoatingsTechnology 123 (2000) pages 219-226.

[0004] Even though multi-layered titanium nitride/titanium aluminumnitride coating schemes exist, for a coating to be effective it mustpossess a certain minimum adhesion to the substrate and it must exhibita certain minimum hardness. It has always been, and still remains, agoal to improve the adhesion of the coating to the substrate of thecoated cutting tool. In addition, it has always been, and still remains,a goal to optimize the hardness of the coated cutting tool. It hasalways been, and still remains, a goal to improve and optimize thecombination of the properties of adhesion and hardness for a coatedcutting tool.

[0005] It would thus be desirable to provide a coated cutting tool(e.g., a nanolayered coated cutting tool), as well as a method formaking the coated cutting tool, wherein the cutting tool possessesimproved adhesion and optimized hardness, as well as an improvement inthe combination of the adhesion and hardness.

[0006] It would also be desirable to provide a metal nitride/metalaluminum nitride coated cutting tool (e.g., a nanolayered titaniumnitride/titanium aluminum nitride coated cutting tool), as well as amethod for making the coated cutting tool, wherein the cutting toolpossesses improved adhesion and optimized hardness, as well as animprovement in the combination of the adhesion and hardness.

[0007] It would also be desirable to provide a metal aluminumnitride/metal aluminum carbonitride coated cutting tool (e.g., ananolayered titanium aluminum nitride/titanium aluminum carbonitridecoated cutting tool), as well as a method for making the coated cuttingtool, wherein the cutting tool possesses improved adhesion and optimizedhardness, as well as an improvement in the combination of the adhesionand hardness.

[0008] It would also be desirable to provide a metal nitride/metalaluminum nitride/metal aluminum carbonitride coated cutting tool (e.g.,a nanolayered titanium nitride/titanium aluminum nitride/metal aluminumcarbonitride coated cutting tool), as well as a method for making thecoated cutting tool, wherein the cutting tool possesses improvedadhesion and optimized hardness, as well as an improvement in thecombination of the adhesion and hardness.

SUMMARY OF THE INVENTION

[0009] In one form, the invention is a nanolayered coated member thatcomprises a substrate that has a surface and a coating on the surface ofthe substrate. The coating comprises a plurality of coating sets ofnanolayers wherein a set comprises alternating nanolayers of a nanolayerof a metal nitride (wherein the metal nitride may optionally includecarbon and/or silicon) and a nanolayer of a metal aluminum nitride(wherein the metal aluminum nitride may optionally include carbon and/orsilicon). The coating includes a bonding region and an outer region. Thebonding region comprises a plurality of the coating sets wherein thethickness of a coating set generally increases as one moves away fromthe surface of the substrate. The outer region comprises a plurality ofthe coating sets. The metal may comprise titanium, niobium, hafnium,vanadium, tantalum, zirconium and/or chromium alone or in combinationwith each other or in combination with other metals including aluminumin the metal nitride layer so long as the composition of the metalnitride layer differs from that of the metal aluminum nitride layer.

[0010] In another form, the invention is a nanolayered coated memberthat comprises a substrate that has a surface and a coating on thesurface of the substrate. The coating comprises a plurality of coatingsets of nanolayers wherein a set comprises alternating nanolayers of ananolayer of a metal aluminum nitride (wherein the metal aluminumnitride may optionally include carbon and/or silicon) and a nanolayer ofa metal aluminum carbonitride (wherein the metal aluminum carbonitridemay optionally include silicon). The coating includes a bonding regionand an outer region. The bonding region comprises a plurality of thecoating sets wherein the thickness of a coating set generally increasesas one moves away from the surface of the substrate. The outer regioncomprises a plurality of the coating sets. The metal may comprisetitanium, niobium, hafnium, vanadium, tantalum, zirconium and/orchromium alone or in combination with each other or in combination withother metals.

[0011] In yet another form, the invention is a nanolayered coated memberthat comprises a substrate that has a surface and a coating on thesurface of the substrate. The coating comprises a plurality of coatingsets of nanolayers wherein a set comprises alternating nanolayers of ananolayer of a metal nitride (wherein the metal nitride may optionallyinclude carbon and/or silicon), a nanolayer of a metal aluminum nitride(wherein the metal aluminum nitride may optionally include carbon and/orsilicon), and a nanolayer of a metal aluminum carbonitride (wherein themetal aluminum carbonitride may optionally include silicon). The coatingincludes a bonding region and an outer region. The bonding regioncomprises a plurality of the coating sets wherein the thickness of acoating set generally increases as one moves away from the surface ofthe substrate. The outer region comprises a plurality of the coatingsets. The metal may comprise titanium, niobium, hafnium, vanadium,tantalum, zirconium and/or chromium alone or in combination with eachother or in combination with other metals including aluminum in themetal nitride layer so long as the composition of the metal nitridelayer differs from that of the metal aluminum nitride layer and metalaluminum carbonitride layer.

[0012] In still another form thereof, the invention is a process formaking a nanolayered coated member, the process comprising the steps of:providing a substrate having a surface; providing a metal target(wherein the metal target may optionally include carbon and/or silicon);providing a metal-aluminum target (wherein the metal-aluminum target mayoptionally include carbon and/or silicon); rotating a substrate betweenthe metal target and the metal-aluminum target; supplying electricalpower at a first level of electrical power to the metal target;supplying electrical power at the first level to the metal-aluminumtarget; depositing a coating comprising coating sets of alternatingnanolayers on the surface of the substrate; changing the deposition rateof the alternating nanolayers over a selected period of time duringwhich electrical power supplied to the metal target changes from thefirst level to a second level; and controlling the deposition rate ofthe alternating nanolayers for a period of time after the electricalpower reaches the second level. The metal may comprise titanium,niobium, hafnium, vanadium, tantalum, zirconium and/or chromium alone orin combination with each other or in combination with other metalsincluding aluminum in the metal target so long as the composition of themetal target differs from that of the metal-aluminum target.

[0013] In still another form thereof, the invention is a process formaking a nanolayered coated member, the process comprising the steps of:providing a substrate having a surface; providing a metal-aluminumtarget (wherein the metal-aluminum target may optionally include carbonand/or silicon); providing a metal-aluminum-carbon target (wherein themetal-aluminum-carbon target may optionally include silicon); rotating asubstrate between the metal-aluminum target and themetal-aluminum-carbon target; supplying electrical power at a firstlevel to the metal-aluminum target; supplying electrical power at thefirst level to the metal-aluminum-carbon target; depositing a coatingcomprising coating sets of alternating nanolayers on the surface of thesubstrate; changing the deposition rate of the alternating nanolayersover a selected period of time during which electrical power supplied tothe metal-aluminum target and the metal-aluminum-carbon target changesfrom the first level to a second level; and controlling the depositionrate of the alternating nanolayers for a period of time after theelectrical power reaches the second level. The metal may comprisetitanium, niobium, hafnium, vanadium, tantalum, zirconium and/orchromium alone or in combination with each other or in combination withother metals.

[0014] In still another form thereof, the invention is a process formaking a nanolayered coated member, the process comprising the steps of:providing a substrate having a surface; providing a metal target(wherein the metal target may optionally include carbon and/or silicon);providing a metal-aluminum target (wherein the metal-aluminum target mayoptionally include carbon and/or silicon); providing ametal-aluminum-carbon target (wherein the metal-aluminum-carbon targetmay optionally include silicon); rotating a substrate between the metaltarget and the metal-aluminum target and the metal-aluminum-carbontarget; supplying electrical power at a first level to the metal target;supplying electrical power at the first level to the metal-aluminumtarget; supplying electrical power at the first level to themetal-aluminum-carbon target; depositing a coating comprising coatingsets of alternating nanolayers on the surface of the substrate; changingthe deposition rate of the alternating nanolayers over a selected periodof time during which electrical power supplied to the metal target andto the metal-aluminum target and to the metal-aluminum-carbon targetchanges from the first level to a second level; and controlling thedeposition rate of the alternating nanolayers for a period of time afterthe electrical power reaches the second level. The metal may comprisetitanium, niobium, hafnium, vanadium, tantalum, zirconium and/orchromium alone or in combination with each other or in combination withother metals including aluminum in the metal target so long as thecomposition of the metal target differs from that of the metal-aluminumtarget and the metal-aluminum-carbon target.

BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The following is a brief description of the drawings that form apart of this patent application:

[0016]FIG. 1 is an isometric view of a specific embodiment of ananolayered coated cutting tool;

[0017]FIG. 2 is schematic cross-sectional view of a cutting edge of thenanolayered coated cutting tool of FIG. 1 showing the substrate with thenanolayered coating comprising a bonding region and an outer region, andalso including a finishing layer and a lubricious layer;

[0018]FIG. 3 is a photomicrograph taken via transmission electronmicroscopy (TEM) technique of the interface between the coating and thesubstrate for the nanolayered coated cutting tool of Example 276;

[0019]FIG. 4 is a photomicrograph taken via transmission electronmicroscopy (TEM) technique of the mid-section of the coating for thenanolayered coated cutting tool of Example 276; and

[0020]FIG. 5 is a photomicrograph taken via transmission electronmicroscopy (TEM) technique of the surface region of the coating for thenanolayered coated cutting tool of Example 276.

DETAILED DESCRIPTION

[0021] Referring to the drawings, FIG. 1 illustrates a specificembodiment of a cutting tool generally designated as 20. Cutting tool 20has a top rake surface 22 and flank surfaces 24. The top rake surface 22intersects with the flank surfaces 24 so as to form cutting edges 26 atthe intersections thereof.

[0022] As shown in FIG. 2, cutting tool 20 comprises a substrate 30 thathas a nanolayered coating as shown by brackets 32. The nanolayeredcoating 32 comprises a bonding region as shown by the brackets 34 inFIG. 2. The bonding region 34 comprises one or more coating sets ofnanolayers (and typically a plurality of coating sets of nanolayers) asdescribed hereinafter. The nanolayered coating 32 also includes an outerregion as shown by brackets 36 in FIG. 2. The outer region comprises aplurality of coating sets of nanolayers as described hereinafter.

[0023]FIG. 2 shows that the nanolayered coating 32 has been applied tothe rake surface 38 and the flank surface(s) 40 of the substrate 30.However, it should be appreciated that there are instances in which thenanolayered coating 32 may only be applied to a selected one of thesurfaces or selected portions of the surfaces of the substrate.

[0024] Referring to one arrangement of the nanolayered coating, thenanolayered coating may comprise two or more coating sets of alternatinglayers of materials wherein one of the materials is a metal nitride andthe other material is a metal aluminum nitride (e.g., titaniumnitride/titanium aluminum nitride or titanium aluminum nitride/titaniumnitride). What this means is that in one specific coating scheme, themetal nitride (e.g., titanium nitride) layer may be the layer closest to(or actually on) the surface of the substrate. Yet, in another specificcoating scheme, the metal aluminum nitride (titanium aluminum nitride)layer may be the layer closest to (or actually on) the surface of thesubstrate. Applicants contemplate that metal nitrides and metal aluminumnitrides of the following metals and their alloys would be acceptablefor use in the nanolayered coating: titanium, niobium, hafnium,vanadium, tantalum, zirconium, and/or chromium alone or in combinationwith each other or in combination with other metals. The metal nitridelayer may include aluminum so long as the composition of the metalnitride layer differs from that of the metal aluminum nitride layer. Themetal nitride and the metal aluminum nitride each may include (as anoptional component) carbon and/or silicon.

[0025] Still making general reference to another arrangement of thenanolayered coating, the nanolayered coating may comprise two or morecoating sets of alternating layers of materials wherein one of thematerials is a metal aluminum nitride and the other material is a metalaluminum carbonitride (e.g., titanium aluminum nitride/titanium aluminumcarbonitride or titanium aluminum carbonitride/titanium aluminumnitride). What this means is that in one specific coating scheme, themetal aluminum nitride (e.g., titanium aluminum nitride) layer may bethe layer closest to (or actually on) the surface of the substrate. Yet,in another specific coating scheme, the metal aluminum carbonitride(e.g., titanium aluminum carbonitride) layer may be the layer closest to(or actually on) the surface of the substrate. Along the lines of themetal nitride/metal aluminum nitride coating sets, applicantscontemplate that the following metals and their alloys would beacceptable for use with the nanolayered coating: titanium, niobium,hafnium, vanadium, tantalum, zirconium, and/or chromium alone or incombination with each other or in combination with other metals. Themetal aluminum nitride may include (as optional components) carbonand/or silicon. The metal aluminum carbonitride may include (as anoptional component) silicon.

[0026] Referring to still another arrangement of the nanolayeredcoating, the nanolayered coating may comprise alternating layers of ametal nitride, a metal aluminum nitride and a metal aluminumcarbonitride. Various arrangements of these nanolayers are presented asfollows when the metal is titanium: titanium nitride/titanium aluminumnitride/titanium aluminum carbonitride or titanium aluminumcarbonitride/titanium aluminum nitride/titanium nitride or titaniumaluminum carbonitride/titanium nitride/titanium aluminum nitride ortitanium aluminum nitride/titanium aluminum carbonitride/titaniumnitride or titanium nitride/titanium aluminum carbonitride/titaniumaluminum nitride or titanium aluminum nitride/titanium nitride/titaniumaluminum carbonitride.

[0027] In one group of these arrangements with titanium as the metal,the titanium nitride layer may be the layer closest to (or actually on)the surface of the substrate. In this group, the titanium aluminumnitride layer and the titanium aluminum carbonitride layer are the otherlayers.

[0028] In another group of these arrangements, the titanium aluminumnitride layer may be the layer closest to (or actually on) the surfaceof the substrate. In this group, the titanium nitride layer and thetitanium aluminum carbonitride layer are the other layers.

[0029] In still another group of the arrangements, the titanium aluminumcarbonitride layer may be the layer closest to (or actually on) thesurface of the substrate. In this group, the titanium nitride layer andthe titanium aluminum nitride layer are the other layers.

[0030] Although the specific compounds for the coating arrangements setforth above are titanium nitride, titanium aluminum nitride and titaniumaluminum carbonitride, applicants contemplate that other metal nitrides,metal aluminum nitrides and metal aluminum carbonitrides would beacceptable. In this regard, other metals and their alloys for the metalnitride, the metal aluminum nitride, and the metal aluminum carbonitrideinclude niobium, hafnium, vanadium, tantalum, zirconium, and/or chromiumalone or in combination with each other or in combination with othermetals. The metal nitride layer may include aluminum so long as thecomposition of the metal nitride layer differs from the composition ofthe metal aluminum nitride layer and the metal aluminum carbonitridelayer. In the above arrangements, the metal nitride (e.g., titaniumnitride) and the metal aluminum nitride (e.g. titanium aluminum nitride)each may (as an option) include carbon and/or silicon. The metalaluminum carbonitride (e.g., titanium aluminum carbonitride) may as anoptimal component include silicon.

[0031] Referring back to the specific coating scheme shown in FIG. 2,the bonding region 34 comprises a plurality of coating sets ofalternating nanolayers of titanium nitride and titanium aluminumnitride. The purpose of the bonding region is to provide good adhesionbetween the coating and the substrate during usage (e.g., metalcuttingapplications). The bonding region has a thickness that ranges betweenabout 0.025 micrometers and about 0.6 micrometers. More preferably, thebonding region has a thickness than ranges between about 0.05micrometers and about 0.4 micrometers. Each nanolayer in the bondingregion (whether it is a nanolayer of titanium nitride or a nanolayer oftitanium aluminum nitride) has a thickness that may range between about0.5 nanometers and about 5 nanometers, and more preferably, may rangebetween about 0.5 nanometers and about 2 nanometers.

[0032] The thickness of the titanium aluminum nitride layer is typicallydifferent than the thickness of the titanium nitride layer. Generallyspeaking, the thickness of a coating layer varies due to one or morefactors where in these factors are set out below without limitation.

[0033] The coating sets that comprise the bonding region are depositedduring the so-called “ramp up” portion of the coating process. The “rampup” portion of the process occurs during the initial part of the processin which the deposition rate is increased from a first level to a secondlevel. Although it depends upon the time to complete the so-called “rampup” portion of the process, the number of coating sets of layers mayextend into the hundreds since each coating set has a thickness in thenanometer range (i.e., a thickness of less than about 100 nanometers).

[0034] As a result of this continuing increase in the deposition rateduring the ramp up period, the thickness of the coating sets in thebonding region changes. More specifically, it is generally the case thatas one moves away from the surface of the substrate, the thickness ofeach coating set increases (typically gradually) until the thickness ofeach coating set reaches a point at which the coating sets exhibit agenerally consistent thickness. In the process, the deposition rateincreases during the ramp up period, which results in the increase inthickness. The increase in deposition may be due to (without limitation)any one or more of the following factors: the gas composition in thechamber, the gas flow rate in the chamber, the sputtering rate of thetarget and/or the level of electrical power supplied to the target.

[0035] It should be appreciated that the increase in the thickness ofeach coating set may be due to each of the nanolayers increasing inthickness. As an alternative, the increase in the thickness of eachcoating set may occur when the thickness of one nanolayer remainssubstantially constant and the thickness of the other nanolayerincreases.

[0036] In the process, for example, once the electrical power to thetargets reaches the second level of electrical power, the electricalpower preferably will be reduced for at least one of the targets to alevel greater than the first level of electrical power for the remainderof the coating process to apply the outer region. The reduced level ofelectrical power may be different for each target. Also, the level ofelectrical power applied to each target may vary during the portion ofthe process to apply the outer region.

[0037] Referring to the bonding region, for example, the titaniumnitride layer and the titanium carbonitride layer may include analuminum content ranging from 0 to a higher level so long as the amountof aluminum is less than that contained in the titanium aluminum nitridelayers and in the titanium aluminum carbonitride layers.

[0038] Still referring to FIG. 2, the plurality of coating sets thatcomprise the outer region are alternating nanolayers of titanium nitrideand titanium aluminum nitride. The outer region has a thickness thatranges between about 1 micrometer and about 20 micrometers so long asthere is good adhesion between the coating and the substrate inmetalworking applications. More preferably, the outer region has athickness that ranges between about 1 micrometer and about 10micrometers. Each nanolayer (whether it is titanium nitride or titaniumaluminum nitride) has a thickness that may range between about 0.5nanometers and about 20 nanometers. More preferably, the thickness ofeach such nanolayer ranges between about 0.5 nanometers and about 10nanometers. Most preferably, the thickness of each such nanolayer rangesbetween about 0.5 nanometers and about 2 nanometers.

[0039] The thickness of each coating set in the outer region may besubstantially equal or the thicknesses may vary. In the situations inwhich the coating sets have a substantially equal thickness, thethickness of the nanolayers that make up the coating set, i.e., titaniumnitride nanolayer and the titanium aluminum nitride nanolayer, may notnecessarily be equal. In fact, as will be seen from the descriptionhereinafter of the coating scheme in FIG. 3, the thickness of thetitanium nitride nanolayer ranges between about 1 nanometer to about 2nanometers and the thickness of the titanium aluminum nitride nanolayerranges between about 10 nanometers to about 11 nanometers. In thisregard, the thickness of the titanium nitride nanolayers in the bondingregion also range between about 1 nanometer to about 2 nanometers whilethe thickness of the titanium aluminum nitride nanolayers increase asthe coating sets move away from the substrate. Applicants contemplatethat the titanium nitride nanolayer can preferably range in thicknessbetween about 0.5 to about 2 nanometers. Applicants also contemplatethat the titanium aluminum nitride nanolayer can preferably range inthickness between about 0.5 to about 11 nanometers.

[0040] As mentioned above, because the sputtering rate for thetitanium-aluminum target is greater than the sputtering rate for thetitanium target, generally speaking, the thickness of each nanolayer oftitanium aluminum nitride may be greater than the thickness of eachnanolayer of titanium nitride.

[0041] Referring to FIG. 2, layer 50 is a finishing layer that maycomprise titanium nitride or titanium aluminum nitride. The thickness offinishing layer 50 is between about 0.1 micrometers and about 3micrometer. Applicants contemplate that metal nitrides, metal aluminumnitrides and metal aluminum carbonitrides would be acceptable as thefinishing layer. In this regard, other metals and their alloys for themetal nitride, the metal aluminum nitride, and the metal aluminumcarbonitride include titanium, niobium, hafnium, vanadium, tantalum,zirconium, and/or chromium alone or in combination with each other or incombination with other metals. The finishing layer alternately or inaddition to the above finishing layers may be an alumina layer. Thefinishing layer is typically applied by physical vapor deposition (PVD)techniques. Layer 52 is a lubricious layer that may comprise a materiallike molybdenum disulfide. The total thickness of finishing layer 50 andlubricious layer 52 is between about 0.1 micrometer and about 3micrometers. The finishing layer and the lubricious layer are eachoptional layers for the coating scheme.

[0042] Still referring to FIG. 2, the substrate 30 is typically a hardmaterial such as cemented carbide. One exemplary composition for thesubstrate 30, which is substrate A, is a cemented (cobalt) tungstencarbide material that has up to 0.1 weight percent tantalum, up to 0.1weight percent niobium, up to 0.1 weight percent titanium, between about0.3 and about 0.5 weight percent chromium, between about 5.7 weightpercent and 6.3 weight percent cobalt with the balance being tungstenand carbon wherein most of the tungsten and carbide is in the form oftungsten carbide. The substrate has a hardness between about 92.6 andabout 93.4 Rockwell A, a coercive force (H_(C)) of between about 250 andabout 320 oersteds, a specific gravity of between about 14.80 and about15.00 grams per cubic centimeter, a tungsten carbide grain size of 1-5micrometers, and a magnetic saturation of between 167.7 and 191.9microTesla cubic meter per kilogram cobalt. As will be discussedhereinafter, the coated cutting inserts used in the turning testscomprised a substrate of the same composition as substrate A.

[0043] Another exemplary composition for the substrate, which issubstrate B, is a cemented (cobalt) tungsten carbide material that hasbetween about 1.2 to about 2.5 weight percent tantalum, between about0.3 to about 0.6 weight percent niobium, up to 0.4 weight percenttitanium, between about 11 weight percent and 12 weight percent cobaltwith the balance being tungsten and carbon wherein most of the tungstenand carbide is in the form of tungsten carbide. The substrate has anominal hardness of about 89.8 Rockwell A, a coercive force (H_(c)) ofbetween about 145 and about 185 oersteds, a specific gravity of betweenabout 14.1 and about 14.5 grams per cubic centimeter, a tungsten carbidegrain size of 1-6 micrometers, and a magnetic saturation of between167.7 and 187.9 microTesla cubic meter per kilogram cobalt. As will bediscussed hereinafter, the coated cutting inserts used in the millingtests comprised a substrate of the same composition as Substrate B.

[0044] The substrate may also be a cermet, a ceramic or a high speedsteel, polycrystalline cubic boron nitride, polycrystalline diamond ordiamond sheet or diamond film. The substrate may take the form of anindexable cutting insert, a cutting insert, a drill, milling cutter, endmill, reamer or tap made of any of the foregoing substrate materials.

[0045] The preferred adhesion strength of the coating to the surface ofthe substrate is at least 45 kilograms (kg). More preferably, theadhesion strength is at least 60 kg, and most preferably the adhesionstrength is at least 100 kg. The test to determine the adhesion strengthis a Rockwell A indentation test.

[0046] The preferable thickness of the entire nanolayered coating,exclusive of a finishing layer and a lubricious layer, is between about1 micrometers and about 21 micrometers, and more preferably thethickness is between about 1 micrometers and about 11 micrometers, andmost preferably the thickness of the entire nanolayered coating isbetween about 2 micrometers and about 6 micrometers.

[0047] Generally speaking, the process to produce the coatings comprisesusing a physical vapor deposition technique such as magnetronsputtering. In the following examples, the apparatus used to apply thecoating was a Cemecon CC800/8 magnetron sputtering coating reactor. Thecoating reactor was configured so that the cutting insert substrateswere rotated between two sets of targets. Each set of targets wasdisposed 180° from the other set. One of the sets of targets was twotargets of titanium and the other set of targets was twotitanium-aluminum targets. The substrate table was rotated at a rate of0.8 revolutions per minute. The substrates were mounted on rotatingplanetary rod fixtures on the substrate table.

[0048] In these examples, the process comprises two basic portions. Thefirst is the so-called “ramp up” portion which the power to the targetsis increased from about 500 watts to a target power, such as, forexample, about 8000 watts, over the course of about 45 minutes. Once thepower reached its target, then as one alternative it is adjusted so asto remain constant (which may be, for example, 8000 watts or a lowerelectrical power level) throughout the balance of the coating process.As another option, the electrical power may be varied during the balanceof the coating process. The nature of the variation may be, for example,as a sinusoidal wave or as a square tooth wave or as a saw tooth wave.

[0049] The following examples were made in a fashion generallyconsistent with the above description of the coating process. Each ofthe examples in Table I includes substrates that had a composition likethat of Substrate A and substrates that had a composition like that ofSubstrate B. The titanium target was solid titanium metal. Thetitanium-aluminum target comprised a titanium metal target havingforty-eight plugs of aluminum therein. The process parameters for eachone of these examples are set forth in Table I below. TABLE I ProcessParameters for Examples of Titanium Nitride/Titanium Aluminum NitrideNanolayer Coatings Ti TiAl Argon Nitrogen Nitrogen Target Target FlowFlow Coating Bias Partial Power Power Rate Rate Time Current FlowExample (KW) (KW) (sccm) (sccm) (hours) (Amps) Rate 274 4 6 175 ˜113 621 0.31 276 4 8 175 ˜120 6 26 0.32 277 8 4 175 ˜119 6 25 0.32 281 4 6175/100 ˜180 6 20 0.5 418 1.6 8 210 ˜90 6 21 .24 422 1.6 8 210 ˜88 6 20.24

[0050] In each one of these examples, the flow rate for the Krypton was80 standard cubic centimeter per minute (sccm). In Table I thedesignation “sccm” for the argon and nitrogen flow rate is standardcubic centimeter per minute. In Table I the nitrogen partial flow rateequals the flow rate of nitrogen (scam) divided by the sum of the flowrates of nitrogen, argon and Krypton (scam). For Example 281 in Table I,the argon flow rate of 175 sccm existed at the start of the ramp upperiod and decreased during the ramp up period to a flow rate equal to100 scam which was maintained during the remainder of the coatingprocess.

[0051] In the processing, there is control over the aluminum content ofthe titanium aluminum nitride depending upon the specific metalcuttingapplication. For some applications it is generally preferred that thealuminum/titanium atomic ratio (Al/Ti atomic ratio) is less than 1.0. Inthese applications, a preferred range for the Al/Ti atomic ratio isbetween about 0.2 and about 0.9. For other applications it is generallypreferred that the Al/Ti atomic ratio be greater than or equal to 1.0wherein a preferred range for the Al/Ti atomic ratio is between 1.0 andabout 2.5. The limitation of the higher end range is based upon theability of the coated cutting insert to have adequate hardness formetalcutting applications.

[0052] To increase the Al/Ti atomic ratio one may increase the level ofelectrical power to the aluminum-containing target(s) and/or control thenitrogen partial flow rate. To obtain a maximum aluminum content with aconstant electrical power to the aluminum-containing target(s), one candecrease the nitrogen partial flow rate. One preferred nitrogen partialflow rate is a rate below 0.5. A more preferred nitrogen partial flowrate is a rate below 0.4. A still more preferred nitrogen partial flowrate is a rate less than 0.35. If the nitrogen partial flow rate isbelow 0.2, then the adhesion and hardness of the layers decreases.Overall, the preferred range for the nitrogen partial flow rate isbetween 0.2 and 0.35.

[0053] Table II below sets forth the process parameters for Example 449.The ramp up for Example 449 was the same as for the earlier examples,except that the titanium targets were replaced bytitanium-aluminum-carbon targets. Each titanium-aluminum-carbon targetcomprised twelve plugs of aluminum and twelve plugs of graphite in atitanium metal target. TABLE II Process Parameters for Example 449(Titanium Aluminum Carbonitride/Titanium Aluminum Nitride NanolayerCoatings) TiAlC TiAl Argon Nitrogen Nitrogen Target Target Flow FlowCoating Bias Partial Power Power Rate Rate Time Current Flow Example(KW) (KW) (sccm) (sccm) (hours) (Amps) Rate 449 8 1.6 210 87 6 15 0.23

[0054] For the processing of Example 449, the flow of Krypton gasremained constant at a rate of 80 standard cubic centimeter per minute.In Table II the designation “sccm” for the argon and nitrogen flow rateis standard cubic centimeter per minute.

[0055] Table III below sets forth the process parameters for Example394. The ramp up for Example 394 was the same as that for Example 449,except that the titanium-aluminum targets were replaced by titaniumtargets. Each titanium-aluminum-carbon target comprised twelve plugs ofaluminum and twelve plugs of graphite in a titanium metal target. TABLEIII Process Parameters for Example 394 (Titanium AluminumCarbonitride/Titanium Nitride Nanolayer Coatings) TiAlC Ti ArgonNitrogen Nitrogen Target Target Flow Flow Coating Bias Partial PowerPower Rate Rate Time Current Flow Example (KW) (KW) (sccm) (sccm)(hours) (Amps) Rate 394 8 1.6 210 80 6 20 0.22

[0056] For the processing of Example 394, the flow of Krypton gasremained constant at a rate of 80 milliliters per minute. In Table IIIthe designation “sccm” for the argon and nitrogen flow rate is standardcubic centimeter per minute.

[0057] Selected properties of the resultant coated cutting tool are setforth in Table IV below. These properties are the aluminum/titaniumatomic ratio, the overall thickness of the coating in micrometers, themicrohardness of the cutting tool in kilograms per square millimeter(kg/mm²) as measured by a standard Vickers test at a 25 gram load andthe indent adhesion strength of the coated cutting tool as measured inkilograms.

[0058] Referring to the analysis of the coating layers, a JEOL 6400Scanning Electron Microscope (SEM) with an Oxford Industries INCA Energy400 Dispersive X-Ray Spectroscopy (EDS) is used to collect compositionalinformation about the coatings (i.e., the titanium aluminum nitridecoatings). Oxford Industries is located at 130A Baker Avenue Ex,Concord, Mass. 01742 and JEOL USA, Inc. is located at 11 Dearborn,Peabody, Mass. 01960.

[0059] The coating is analyzed in the as deposited state with noadditional sample preparation or conductive coating applied. X-Rays arecollected using a 15 KV accelerating voltage.

[0060] The coating must be a minimum of about 3 micrometers in thicknessto prevent the excitation of the substrate by the electron beam (thickercoatings would be necessary if a higher accelerating voltage was used).A minimum of 5 spectra are collected and the results quantified. Theapparent concentration of each element is equal to the intensity of thatelement in the sample times the weight percent of that element in thestandard divided by the intensity of the element in the standard. Thismust then be corrected for inter-element effects so that the weightpercent of the element is equal to the apparent concentration divided bythe intensity correction. Atomic percentages are then calculated bydividing the weight percent by the atomic weight of the element. Thereare several methods of calculating intensity corrections. Thisparticular analytical scheme uses a Phi-Rho-Z approach. Since correctionfactors are dependent on the composition of the sample, trueconcentrations are derived using an iterative calculation. TABLE IVSelected Properties of the Examples Using Substrate A Average Values ofVickers Indent Al/Ti Atomic Thickness Microhardness Adhesion ExampleRatio (%) (μm) (kg/mm²) Strength (kg) 274 0.6 3.4/4.1/3.4 2770 ± 101 >60276 0.67 3.9/4.1/3.8 3051 ± 133 >60 277 0.25 4.1/3.9/3.6 2856 ± 071 >60281 0.46 3.2/2.8/2.9 2767 ± 169 >60 418 1.1 4.5/5.6/5.3 2774 ± 32  >60422 1.18 3.6/3.6/4.0 2818 ± 245 >60 394 0.24 [4.9 4.2/4.1/4.0 3016 ±133 >60 atomic % carbon present] 449 0.36 [2.9 4.4/4.2/3.9 2899 ±60  >60 atomic % carbon present]

[0061] The examples set out in Table IV used substrates that had acomposition like that of Substrate A. For the properties listed in TableIV, applicants expect that the coated cutting inserts using a substratethat had a composition like Substrate B would exhibit the same orsubstantially similar properties.

[0062] Some of the examples were tested in a turning application. Theturning parameters were: workpiece material was 304 stainless steel, thespeed was 500 surface feet per minute (sfm) [152 meters per minute], thefeed was 0.012 inches per revolution (ipr) [0.3 millimeters perrevolution], the depth of cut was 0.080 inches (d.o.c.) [2 millimetersd.o.c.], and flood coolant. The cutting tool was a CNGP432 style ofcutting tool with a negative 5 degrees lead angle and a sharp cuttingedge. The results of the turning tests are set forth in Table III below.

[0063] The criteria for the tool life are as follows: uniform flankwear: 0.012 inches (0.3 millimeters); maximum flank wear: 0.016 inches(0.4 millimeters); nose wear: 0.016 inches (0.4 millimeters); craterwear: 0.004 inches (0.100 millimeters); chip width on rake: 0.020 inches(0.5 millimeters); and depth of cut notch: 0.016 inches (0.4millimeters). TABLE V Tool Life (Minutes) for Turning of 304 StainlessSteel Example Rep. 1 Rep. 2 Average Std. Deviation 277 18.00 14.30 16.152.62 274 14.93 23.56 19.24 6.11 281 12.46 11.00 11.73 1.03 276 27.2821.66 24.57 3.97 KC5010 14.00 16.00 15.00 1.41 [Comparative Example]

[0064] For Comparative Example KC5010, the substrate had the samecomposition as Substrate A. The coating was a single layer of titaniumaluminum nitride with a nominal thickness of about 4.0 micrometers.Still referring to Comparative Example KC5010, the Al/Ti ratio equaledabout 1.0, and the microhardness equaled about 2500 Kg/mm². The KC5010cutting tool is a prior art cutting tool available from Kennametal Inc.of Latrobe, Pa.

[0065] Referring to the photomicrograph FIG. 3, there is shown thebonding region and the outer region of the coating scheme from Example276. For each one of the bonding region and the outer region there arealternating nanolayers of titanium nitride and titanium aluminumnitride. The dark nanolayers are titanium nitride and the lightnanolayers are titanium aluminum nitride.

[0066] For FIG. 3, and also FIGS. 4 and 5, it should be appreciated thatapplicants believe that the visual contrast in darkness between thenanolayers shows that the titanium nitride nanolayers have no aluminumcontained therein, or significantly less aluminum contained therein thando the titanium aluminum nitride nanolayers. It should be appreciatedthat the titanium nitride nanolayers are not necessarily pure titaniumnitride since they may contain aluminum. To the extent there is aluminumcontained in the titanium nitride nanolayers, this aluminum content mayvary between the titanium nitride nanolayers. Applicants believe thatthe splotchy areas in the figures, and especially FIG. 3, are artifactsof TEM specimen preparation.

[0067] Referring to the bonding region, the nanolayers of titaniumnitride have a thickness of between about 1 to 2 nanometers. Thethickness of the titanium nitride nanolayers remains substantiallyconstant throughout the bonding region. The thickness of the titaniumaluminum nitride nanolayers begins at a range between about 1 to about 2nanometers at and near the interface between the coating and thesubstrate. The substrate is the black area in the upper right-handcorner of the photomicrograph. The thickness of the titanium aluminumnitride layers increases as one moves away from the surface of thesubstrate. The thickness of the titanium aluminum nitride nanolayersincreases to a range between about 10 to about 11 nanometers.

[0068] Referring to the photomicrograph FIG. 4, there is shown the bulkregion of the coating scheme. The bulk region comprises alternatingnanolayers of titanium nitride and titanium aluminum nitride wherein onenanolayer of titanium nitride and one nanolayer of titanium aluminumnitride comprises a coating set. The thickness of each nanolayer oftitanium nitride is about equal and ranges between about 1 to about 2nanometers. The thickness of each nanolayer of titanium aluminum nitrideis about equal and ranges between about 10 nanometers to about 11nanometers.

[0069] Referring to the photomicrograph FIG. 5, there is shown theregion of the coating scheme that includes the outer surface thereof.This region of the coating scheme comprises alternating nanolayers oftitanium nitride and titanium aluminum nitride wherein one nanolayer oftitanium nitride and one nanolayer of titanium aluminum nitridecomprises a coating set. The thickness of each nanolayer of titaniumnitride is about equal and ranges between about 1 to about 2 nanometers.The thickness of each nanolayer of titanium aluminum nitride is aboutequal and ranges between about 10 nanometers to about 11 nanometers.

[0070] The examples were tested in a milling application. The millingparameters were: workpiece material was 4140 steel, the speed was 600surface feet per minute (sfm) [183 meters per minute], the feed was0.012 inches per revolution (ipr) [0.3 millimeters per revolution], theaxial depth of cut (a.d.o.c.) was 0.100 inches [2.5 millimeters rdoc]and the radial depth of cut (r.d.o.c.) was 3.0 inches [75 millimetersrdoc], and flood coolant. The cutting tool was a SEHW43A6T style ofcutting tool with a 45 degree lead angle and a T land of 0.2 millimetersand 20 degrees. The results of the milling tests are set forth in TableVI below.

[0071] The criteria for the tool life are as follows: uniform flankwear: 0.012 inches (0.3 millimeters); maximum flank wear: 0.016 inches(0.4 millimeters); nose wear: 0.016 inches (0.4 millimeters); craterwear: 0.004 inches (0.100 millimeters); and chip width on rake: 0.030inches (0.75 millimeters). The examples set out in Table VI used asubstrate that had a composition like Substrate B. Comparative ExampleKC525M is a cutting tool that has a substrate with a composition likethat of Substrate B and a coating of titanium aluminum nitride whereinthe coating has a nominal thickness of about 4 micrometers. TABLE VITool Life (Minutes) for Milling of 4140 Steel Average Tool Life/Std.Example Rep. 1 Rep. 2 Rep. 3 Deviation 277 7.45 6.62 9.10 7.72/1.26 2747.45 8.28 8.28 8.00/0.48 281 4.96 7.45 8.28 6.90/1.73 276 8.28 4.97 8.287.18/1.91 KC525M 4.97 4.97 6.62 5.52/0.96 [Comparative Example]

[0072] The patents and other documents identified herein are herebyincorporated by reference herein.

[0073] Other embodiments of the invention will be apparent to thoseskilled in the art from a consideration of the specification or apractice of the invention disclosed herein. It is intended that thespecification and examples are illustrative only and are not intended tobe limiting on the scope of the invention. The true scope and spirit ofthe invention is indicated by the following claims.

What is claimed is:
 1. A nanolayered coated member comprising: asubstrate having a surface and a coating on the surface of thesubstrate; the coating comprising a plurality of coating sets ofnanolayers wherein each coating set comprising alternating nanolayers ofa metal nitride and a metal aluminum nitride; the coating including abonding region and an outer region; and the bonding region comprising aplurality of the coating sets wherein the thickness of the coating setsincrease as one moves away from the surface of the substrate.
 2. Thecoated member according to claim 1 wherein the metal is selected fromthe group comprising titanium, niobium, hafnium, vanadium, tantalum,molybdenum, zirconium, chromium and tungsten alone or in combinationwith each other or in combination with other metals.
 3. The coatedmember according to claim 1 wherein the substrate is selected from thegroup comprising cemented carbide, cermet, ceramic, high speed steel,diamond, polycrystalline diamond, and polycrystalline cubic boronnitride.
 4. The coated member according to claim 1 wherein the coatinghas a thickness ranging between about 1 micrometer and about 21micrometers.
 5. The coated member according to claim 1 wherein thebonding region has a thickness ranging between about 0.025 micrometersand about 0.6 micrometers.
 6. The coated member according to claim 1wherein the bonding region has a thickness ranging between about 0.05micrometers and about 0.4 micrometers.
 7. The coated member according toclaim 1 wherein each one of the metal nitride nanolayers and each one ofthe metal aluminum nitride nanolayers in the bonding region has athickness between about 0.5 nanometers and about 5 nanometers.
 8. Thecoated member according to claim 1 wherein each one of the metal nitridenanolayers and each one of the metal aluminum nitride nanolayers in thebonding region has a thickness between about 0.5 nanometers and about 2nanometers.
 9. The coated member according to claim 1 wherein the outerregion has a thickness ranging between about 1 micrometer and about 20micrometers.
 10. The coated member according to claim 1 wherein each oneof the metal nitride nanolayers and each one of the metal aluminumnitride nanolayers in the outer region has a thickness between about 0.5nanometers and about 20 nanometers.
 11. The coated member according toclaim 1 wherein each one of the metal nitride nanolayers and each one ofthe metal aluminum nitride nanolayers in the outer region has athickness between about 0.5 nanometers and about 10 nanometers.
 12. Thecoated member according to claim 1 wherein each one of the metal nitridenanolayers and each one of the metal aluminum nitride nanolayers in thebonding region has a thickness between about 0.5 nanometers and about 2nanometers.
 13. The coated member according to claim 1 wherein the metalis titanium, and for each of the coating sets the titanium aluminumnitride nanolayer having a thickness and the titanium nitride nanolayerhaving a thickness, and the thickness of the titanium aluminum nitridenanolayer being different from the thickness of the titanium nitridenanolayer.
 14. The coated member according to claim 1 wherein the metalis titanium, and for each of the coating sets the titanium aluminumnitride nanolayer having a thickness and the titanium nitride nanolayerhaving a thickness, and the thickness of the titanium aluminum nitridenanolayer being greater than the thickness of the titanium nitridenanolayer.
 15. The coated member according to claim 14 wherein thethickness of the titanium nitride nanolayer remains substantially thesame as one moves away from the surface of the substrate.
 16. The coatedmember according to claim 13 wherein each nanolayer of the titaniumnitride in the bonding region has a thickness ranging between about 0.5nanometers and about 2 nanometers.
 17. The coated member according toclaim 13 wherein each nanolayer of the titanium aluminum nitride in thebonding region has a thickness ranging between about 0.5 nanometers andabout 11 nanometers.
 18. The coated member according to claim 13 whereineach nanolayer of titanium nitride in the outer region has a thicknessranging between about 0.5 nanometers and about 2 nanometers.
 19. Thecoated member according to claim 13 wherein each nanolayer of titaniumaluminum nitride in the outer region has a thickness ranging betweenabout 0.5 nanometers and about 11 nanometers.
 20. The coated memberaccording to claim 1 wherein for each of the coating sets in the bondingregion the thickness of the metal nitride nanolayer being different fromthe thickness of the metal aluminum nitride nanolayer.
 21. The coatedmember according to claim 20 wherein for each of the coating sets in thebonding region, the metal aluminum nitride nanolayer having a greaterthickness than the thickness of the metal nitride nanolayer.
 22. Thecoated member according to claim 1 wherein for each of the coating setsin the outer region the thickness of the metal nitride nanolayer beingdifferent from the thickness of the metal aluminum nitride nanolyer. 23.The coated member according to claim 22 wherein for each of the coatingsets in the outer region, the metal aluminum nitride nanolayer having agreater thickness than the thickness of the metal nitride nanolayer. 24.The coated member according to claim 22 wherein for each of the coatingsets in the outer region the thickness of the metal aluminum nitridenanolayer being at least about five times as great as the thickness ofthe metal nitride nanolayer.
 25. The coated member according to claim 1wherein the coated member comprising one of the following: a cuttinginsert, an indexable cutting insert, a drill, a milling cutter, an endmill, a reamer, and a tap.
 26. The coated member according to claim 1wherein the outer region comprising a plurality of the coating setswherein the thickness of each one of the coating sets is about equal.27. The coated member according to claim 1 further including a finishinglayer applied to the outer surface of the coating.
 28. The coated memberaccording to claim 27 wherein the finishing layer comprising one or morelayers of one or more of the following: alumina, and nitrides, aluminumnitrides and aluminum carbonitrides of one or more of titanium, niobium,hafnium, vanadium, tantalum, zirconium, chromium alone or in combinationwith each other or in combination with other metals.
 29. The coatedmember according to claim 27 further including a lubricous coating onthe finishing coating.
 30. The coated member according to claim 1wherein in the metal aluminum nitride nanolayer the aluminum/titaniumatomic ratio ranges between about 0.2 to about 2.5.
 31. The coatedmember according to claim 30 wherein the aluminum/titanium atomic ratiois greater than zero and less than 1.0.
 32. The coated member accordingto claim 31 wherein the aluminum/titanium atomic ratio is greater than0.2 and less than 0.9.
 33. The coated member according to claim 30wherein the aluminum/titanium atomic ratio is equal to or greater than1.0 and less than 2.5.
 34. The coated member according to claim 1wherein the metal nitride nanolayer including aluminum therein, and thecomposition of the aluminum-containing metal nitride nanolayer beingdifferent from the composition of the metal aluminum nitride nanolayer.35. The coated member according to claim 34 wherein the aluminum contentin the aluminum-containing metal nitride nanolayer being less than thealuminum content in the metal aluminum nitride nanolayer.
 36. The coatedmember according to claim 35 wherein the metal is titanium.
 37. Ananolayered coated member comprising: a substrate having a surface and acoating on the surface of the substrate; the coating comprising aplurality of coating sets of nanolayers wherein each coating setcomprising alternating nanolayers of a metal aluminum nitride and ametal aluminum carbonitride; the coating including a bonding region andan outer region; and the bonding region comprising a plurality of thecoating sets wherein the thickness of each coating set increases as onemoves away from the surface of the substrate.
 38. The coated memberaccording to claim 37 wherein the metal is selected from the groupcomprising titanium, niobium, hafnium, vanadium, tantalum, molybdenum,zirconium, chromium and tungsten alone or in combination with each otheror in combination with other metals.
 39. The coated member according toclaim 37 wherein the substrate is selected from the group comprisingcemented carbide, cermet, ceramic, high speed steel, diamond,polycrystalline diamond, and polycrystalline cubic boron.
 40. The coatedmember according to claim 37 wherein for each of the coating sets in thebonding region the thickness of the metal aluminum nitride nanolayerbeing different from the thickness of the metal aluminum carbonitridenanolayer.
 41. The coated member according to claim 37 wherein for eachof the coating sets in the outer region the thickness of the metalaluminum nitride nanolayer being different than the thickness of themetal aluminum carbonitride nanolayer.
 42. The coated member accordingto claim 37 wherein the outer region comprising a plurality of thecoating sets wherein the thickness of each coating set is about equal.43. The coated member according to claim 37 wherein the coated membercomprising a cutting insert, the cutting insert having a rake surfaceand a flank surface, the rake surface and the flank surface intersectingto form a cutting edge.
 44. The coated member according to claim 37wherein the metal is titanium, and for each of the coating sets thetitanium aluminum nitride nanolayer having a thickness and the titaniumaluminum carbonitride nanolayer having a thickness, and the thickness ofthe titanium aluminum nitride nanolayer being different from thethickness of the titanium aluminum carbonitride nanolayer.
 45. Thecoated member according to claim 37 further including a finishing layerapplied to the outer surface of the coating.
 46. The coated memberaccording to claim 45 wherein the finishing layer comprises one or moreof the following: alumina, and nitrides, aluminum nitrides and aluminumcarbonitrides of one or more of titanium, niobium, hafnium, vanadium,tantalum, zirconium, chromium alone or in combination with each other orin combination with other metals.
 47. The coated member according toclaim 37 further including a lubricious coating on the finishingcoating.
 48. The coated member according to claim 37 wherein in themetal aluminum nitride nanolayer the aluminum/titanium atomic ratioranges between about 0.2 to about 2.5, and in the metal aluminumcarbonitride nanolayer the aluminum/titanium atomic ratio ranges betweenabout 0.2 and about 2.5.
 49. The coated member according to claim 48wherein the aluminum/titanium atomic ratio in the metal aluminum nitridenanolayer is greater than zero and less than 1.0, and thealuminum/titanium atomic ratio in the metal aluminum carbonitridenanolayer is greater than zero and less than 1.0.
 50. The coated memberaccording to claim 49 wherein the aluminum/titanium atomic ratio in themetal aluminum nitride nanolayer is between 0.2 and 0.9, and thealuminum/titanium atomic ratio in the metal aluminum carbonitridenanolayer is between 0.2 and 0.9.
 51. The coated member according toclaim 37 wherein in the metal aluminum nitride nanolayer thealuminum/titanium atomic ratio ranges between greater than 1.0 and lessthan 2.5, and in the metal aluminum carbonitride nanolayer thealuminum/titanium atomic ratio ranges between greater than 1.0 and lessthan 2.5.
 52. A nanolayered coated member comprising: a substrate havinga surface and a coating on the surface of the substrate; the coatingcomprising a plurality of coating sets of nanolayers wherein each setcomprising alternating nanolayers of a metal nitride and a metalaluminum nitride and a metal aluminum carbonitride; the coatingincluding a bonding region and an outer region; and the bonding regioncomprising a plurality of the coating sets wherein the thickness of eachcoating set increases as one moves away from the surface of thesubstrate.
 53. The coated member according to claim 52 wherein the metalis selected from the group comprising titanium, niobium, hafnium,vanadium, tantalum, molybdenum, zirconium, chromium and tungsten aloneor in combination with each other or in combination with other metals.54. The coated member according to claim 52 wherein the substrate isselected from the group comprising cemented carbide, cermet, ceramic,high speed steel, diamond, polycrystalline diamond, and polycrystallinecubic boron nitride.
 55. The coated member according to claim 52 whereinfor each of the coating sets in the bonding region the thickness of themetal nitride nanolayer being different from the thickness of the metalaluminum nitride nanolayer, the thickness of the metal nitride nanolayerbeing different from the thickness of the metal aluminum carbonitridenanolayer, and the thickness of the metal aluminum nitride nanolayerbeing different from the thickness of the metal aluminum carbonitridenanolayer.
 56. The coated member according to claim 52 wherein for eachof the coating sets in the outer region the thickness of the metalnitride nanolayer being different from the thickness of the metalaluminum nitride nanolayer, the thickness of the metal nitride nanolayerbeing different from the thickness of the metal aluminum carbonitridenanolayer, and the thickness of the metal aluminum nitride nanolayerbeing different form the thickness of the metal aluminum carbonitridenanolayer.
 57. The coated member according to claim 52 wherein the outerregion comprising a plurality of the coating sets wherein the thicknessof each coating set is about equal.
 58. The coated member according toclaim 52 wherein the coated member comprising one of the following: acutting insert, an indexable cutting insert, a drill, a milling cutter,an end mill, a reamer and a tap.
 59. The coated member according toclaim 52 further including a finishing layer applied to the outersurface of the coating.
 60. The coated member according to claim 59wherein the finishing layer comprising one or more layers of one or moreof the following: alumina, and nitrides, aluminum nitrides and aluminumcarbonitrides of one or more of titanium, niobium, hafnium, vanadium,tantalum, zirconium, chromium alone or in combination with each other orin combination with other metals.
 61. The coated member according toclaim 59 further including a lubricious coating on the finishingcoating.
 62. The coated member according to claim 52 wherein in themetal aluminum nitride nanolayer the aluminum/titanium atomic ratioranges between about 0.2 to about 2.5, and in the metal aluminumcarbonitride nanolayer the aluminum/titanium atomic ratio ranges betweenabout 0.2 and about 2.5.
 63. The coated member according to claim 62wherein the aluminum/titanium atomic ratio in the metal aluminum nitridenanolayer is greater than zero and less than 1.0, and thealuminum/titanium atomic ratio in the metal aluminum carbonitridenanolayer is greater than zero and less than 1.0.
 64. The coated memberaccording to claim 63 wherein the aluminum/titanium atomic ratio in themetal aluminum nitride nanolayer is between 0.2 and 0.9, and thealuminum/titanium atomic ratio in the metal aluminum carbonitridenanolayer is between 0.2 and 0.9.
 65. The coated member according toclaim 52 wherein in the metal aluminum nitride nanolayer thealuminum/titanium atomic ratio ranges between greater than 1.0 and lessthan 2.5, and in the metal aluminum carbonitride nanolayer thealuminum/titanium atomic ratio ranges between greater than 1.0 and lessthan 2.5.
 66. The coated member according to claim 52 wherein the metalnitride nanolayer including aluminum therein, and the composition of thealuminum-containing metal nitride nanolayer being different from thecomposition of the metal aluminum nitride nanolayer.
 67. The coatedmember according to claim 66 wherein the aluminum content in thealuminum-containing metal nitride nanolayer is less than the aluminumcontent in the metal aluminum nitride nanolayer.
 68. The coated memberaccording to claim 67 wherein the metal is titanium.
 69. A process formaking a nanolayered coated member, the process comprising the steps of:providing a substrate having a surface; providing a metal target;providing a metal aluminum target; rotating a substrate between themetal target and the metal aluminum target; supplying electrical powerat a first level to the metal target; supplying electrical power at thefirst level to the metal aluminum target; depositing a coatingcomprising coating sets of alternating nanolayers on the surface of thesubstrate; changing the deposition rate of the alternating nanolayersover a selected period of time during which electrical power supplied tothe metal target and the metal-aluminum target changes from the firstlevel to a second level; and controlling the deposition rate of thealternating nanolayers for a period of time after the electrical powerreaches the second level.
 70. The process according to claim 69 whereinthe alternating nanolayers comprise a metal nitride and a metal aluminumnitride.
 71. The process according to claim 69 wherein the alternatingnanolayers comprise a metal nitride and a metal aluminum nitride, thedepositing step includes depositing a plurality of coating sets of thealternating nanolayers during the time the electric power to the metaltarget and to the metal aluminum target changes from the first to thesecond level so as to deposit a bonding region of the coating.
 72. Theprocess according to claim 71 wherein each coating set included in thebonding region has a thickness, and the thickness of the coating sets inthe bonding region increases as one moves away from the surface of thesubstrate.
 73. The process according to claim 69 the depositing stepincludes depositing a plurality of the coating sets of the alternatingnanolayers during the time after the electrical power has reached thesecond level so as to deposit an outer region of the coating.
 74. Theprocess according to claim 73 wherein each coating set included in theouter region has a thickness, and the thickness of each one of thecoating sets remaining about equal.
 75. The process according to claim73 wherein for the outer region the metal nitride nanolayer has athickness and the metal aluminum nitride nanolayer has a thickness, andthe thickness of the metal aluminum nitride nanolayer being differentfrom the thickness of the metal nitride nanolayer.
 76. The processaccording to claim 70 wherein for the bonding region the metal nitridenanolayer has a thickness and the metal aluminum nitride nanolayer has athickness, and the thickness of the metal aluminum nitride nanolayerbeing different from the thickness of the metal nitride nanolayer. 77.The process according to claim 69 further including depositing afinishing layer on the outer surface of the coating.
 78. The processaccording to claim 77 wherein the finishing layer comprising one or morelayers of one or more of the following: alumina, and nitrides, aluminumnitrides and aluminum carbonitrides of one or more of titanium, niobium,hafnium, vanadium, tantalum, zirconium, chromium alone or in combinationwith each other or in combination with other metals.
 79. The processaccording to claim 77 further including depositing a lubricious layer onthe surface of the finishing layer.
 80. The process according to claim69 wherein the coated member comprising one of the following: a cuttinginsert, an indexable cutting insert, a drill, a milling cutter, an endmill, a reamer and a tap.
 81. The process according to claim 69 furtherincluding supplying nitrogen at a pre-selected nitrogen partial flowrate.
 82. The process according to claim 81 wherein the nitrogen partialflow rate is below 0.5.
 83. The process according to claim 81 whereinthe nitrogen partial flow rate is below 0.4.
 84. The process accordingto claim 81 wherein the nitrogen partial flow rate ranges between about0.35 and about 0.2.
 85. The process according to claim 69 wherein thefirst level of electrical power is less than the second level ofelectrical power.
 86. A process for making a nanolayered coated member,the process comprising the steps of: providing a substrate having asurface; providing a metal-aluminum target; providing ametal-aluminum-carbon target; rotating a substrate between themetal-aluminum target and the metal-aluminum-carbon target; supplyingelectrical power at a first level to the metal-aluminum target;supplying electrical power at the first level to themetal-aluminum-carbon target; depositing a coating comprising coatingsets of alternating nanolayers on the surface of the substrate; changingthe deposition rate of the alternating nanolayers over a selected periodof time during which electrical power supplied to the metal-aluminumtarget and to the metal-aluminum-carbon target changes from the firstlevel to a second level; and controlling the deposition rate of thealternating nanolayers for a period of time after the electrical powerreaches the second level.
 87. The process according to claim 86 whereinthe depositing step comprises depositing a plurality of coating sets ofalternating nanolayers of metal aluminum nitride and a metal aluminumcarbonitride.
 88. The process according to claim 86 wherein thedepositing step includes depositing a plurality of coating sets ofalternating nanolayers of metal aluminum nitride and metal aluminumcarbonitride during the time the electric power is increased to themetal-aluminum target and to the metal-aluminum-carbon target so as todeposit a bonding region of the coating.
 89. The process according toclaim 88 wherein each one of the coating sets included in the bondingregion has a thickness and the thickness of the coating sets increasesas one moves away from the surface of the substrate.
 90. The processaccording to claim 88 wherein the depositing step further includesdepositing a plurality of alternating nanolayers of metal aluminumnitride and metal aluminum carbonitride during the time after theelectrical power has reached the second level as to deposit an outerregion of the coating.
 91. The process according to claim 90 whereineach one of the coating sets included in the outer region has athickness, and the thickness of the coating sets remaining about equal.92. The process according to claim 86 wherein the depositing stepcomprises depositing a plurality of coating sets of alternating layersof metal aluminum nitride and metal aluminum carbonitride so as to forma bonding region.
 93. The process according to claim 92 wherein for thebonding region the metal aluminum nitride layer has a thickness and themetal aluminum carbonitride layer has a thickness, and the thickness ofthe metal aluminum carbonitride layer being different from the thicknessof the metal aluminum nitride layer.
 94. The process according to claim86 wherein the depositing step comprises depositing a plurality ofcoating sets of alternating layers of metal aluminum nitride and metalaluminum carbonitride so as to form an outer region.
 95. The processaccording to claim 94 wherein for the outer region the metal aluminumnitride layer has a thickness and the metal aluminum carbonitride layerhas a thickness, and the thickness of the metal aluminum carbonitridelayer being different from the thickness of the metal aluminum nitridelayer.
 96. The process according to claim 86 further includingdepositing a finishing layer on the outer surface of the coating. 97.The process according to claim 96 wherein the finishing layer comprisingone or more layers of one or more of the following: alumina, andnitrides, aluminum nitrides and aluminum carbonitrides of one or more oftitanium, niobium, hafnium, vanadium, tantalum, zirconium, chromiumalone or in combination with each other or in combination with othermetals.
 98. The process according to claim 96 further includingdepositing a lubricious coating on the surface of the finishing coating.99. The process according to claim 86 wherein the coated membercomprising a cutting insert, a drill, an end mill, a milling cutter, areamer and a tap.
 100. The process according to claim 86 furtherincluding supplying nitrogen at a pre-selected nitrogen partial flowrate.
 101. The process according to claim 100 wherein the nitrogenpartial flow rate is below 0.5.
 102. The process according to claim 100wherein the nitrogen partial flow rate is below 0.4.
 103. The processaccording to claim 100 wherein the nitrogen partial flow rate rangesbetween about 0.35 and about 0.2.
 104. The process according to claim 86wherein the first level of electrical power is less than the secondlevel of electrical power.
 105. A process for making a nanolayeredcoated member, the process comprising the steps of: providing asubstrate having a surface; providing a metal target; providing a metalaluminum target; providing a metal-aluminum-carbon target; rotating asubstrate between the metal target and the metal aluminum target and themetal-aluminum-carbon; supplying electrical power at a first level tothe metal target; supplying electrical power at the first level to themetal aluminum target; supplying electrical power at the first level tothe metal-aluminum-carbon target; depositing a coating comprisingcoating sets of alternating nanolayers on the surface of the substrate;changing the deposition rate of the alternating nanolayers over aselected period of time during which electrical power supplied to themetal target and to the metal-aluminum target and to themetal-aluminum-carbon target changes from the first level to a secondlevel; and controlling the deposition rate of the alternating nanolayersfor a period of time after the electrical power reaches the secondlevel.
 106. The process according to claim 105 wherein the depositingstep comprises depositing a plurality of coating sets of alternatingnanolayers of a metal nitride and a metal aluminum nitride and a metalaluminum carbonitride.
 107. The process according to claim 105 whereinthe depositing step includes depositing a plurality of coating sets ofalternating nanolayers of metal nitride and metal aluminum nitride and ametal aluminum carbonitride during the time the electric power isincreased to the metal target and the metal aluminum target and themetal aluminum carbon target so as to deposit a bonding region.
 108. Theprocess according to claim 107 wherein for the bonding region eachcoating set included in the bonding region has a thickness and thethickness of each coating set increases as one moves away from thesurface of the substrate.
 109. The process according to claim 105wherein the depositing step further includes depositing a plurality ofalternating nanolayers of metal nitride and metal aluminum nitride andmetal aluminum carbonitride during the time after the electrical powerhas reached the second level so as to deposit an outer region.
 110. Theprocess according to claim 109 wherein for the outer region each coatingset included in the outer region has a thickness, and the thickness ofeach one of the coating sets remaining about equal.
 111. The processaccording to claim 105 wherein the depositing step comprises depositinga plurality of coating sets of alternating layers of metal nitride andmetal aluminum nitride and metal aluminum carbonitride so as to form abonding region.
 112. The process according to claim 111 wherein for eachof the coating sets in the bonding region the metal nitride nanolayerhas a thickness and the metal aluminum nitride nanolayer has a thicknessand the metal aluminum carbonitride nanolayer has a thickness, and thethickness of the metal aluminum nitride layer being different from thethickness of the metal nitride nanolayer and the thickness of the metalaluminum nitride nanolayer being different from the thickness of themetal aluminum carbonitride nanolayer, and the thickness of the metalaluminum nitride nanolayer being different from the thickness of themetal aluminum carbonitride nanolayer.
 113. The process according toclaim 105 wherein the depositing step comprises depositing a pluralityof coating sets of alternating layers of metal nitride and metalaluminum nitride and metal aluminum carbonitride so as to form an outerregion.
 114. The process according to claim 105 wherein for each of thecoating sets in the outer region the metal nitride layer has a thicknessand the metal aluminum nitride layer has a thickness and the metalaluminum carbonitride layer has a thickness, and the thickness of themetal aluminum nitride layer being different from the thickness of themetal nitride layer and the thickness of the metal aluminum carbonitridelayer, and the thickness of the metal aluminum nitride layer beingdifferent from the thickness of the metal aluminum carbonitride layer.115. The process according to claim 105 further including a depositing afinishing layer on the outer surface of the coating.
 116. The processaccording to claim 115 wherein the finishing layer comprising one ormore layers of one or more of the following: alumina and nitrides,aluminum nitrides and aluminum carbonitrides of one or more of titanium,niobium, hafnium, vanadium, tantalum, zirconium, chromium alone or incombination with each other or in combination with other metals. 117.The process according to claim 115 further including depositing alubricious coating on the surface of the finishing coating.
 118. Theprocess according to claim 105 wherein the coated member comprising acutting insert, a drill, a milling cutter, an end mill, a reamer and atap.
 119. The process according to claim 105 further including supplyingnitrogen at a pre-selected nitrogen partial flow rate.
 120. The processaccording to claim 119 wherein the nitrogen partial flow rate is below0.5.
 121. The process according to claim 119 wherein the nitrogenpartial flow rate is below 0.4.
 122. The process according to claim 119wherein the nitrogen partial flow rate ranges between about 0.35 andabout 0.2.
 123. The process according to claim 105 wherein the firstlevel of electrical power is less than the second level of electricalpower.
 124. A nanolayered coated member comprising: a substrate having asurface and a coating on the surface of the substrate; and the coatingcomprising a plurality of coating sets of nanolayers wherein eachcoating set comprising alternating nanolayers of titanium aluminumnitride and titanium aluminum carbonitride.
 125. The nanolayered coatedmember according to claim 124 wherein the coating including a bondingregion, the bonding region being adjacent to the substrate surface. 126.The nanolayered coated member according to claim 125 wherein the bondingregion comprising a plurality of the coating sets wherein the thicknessof each coating set increases as one moves away from the surface of thesubstrate.
 127. The nanolayered coated member according to claim 125wherein the coating including an outer region, the outer region beingadjacent to the bonding region.
 128. The nanolayered coated memberaccording to claim 125 wherein the outer region comprising a pluralityof the coating sets, and wherein the thickness of each one of thecoating set being about equal.